Agradecimentos: Financial support was provided by the Sao Paulo Research Foundation (FAPESP) grants [2014/17774-1 and 2016/07911-7] and the Brazilian National Council for Scientific and Technological Development (CNPq) grants [424395/2016-9 and 308914/2017-1]

Abstract: Advanced oxidation processes, including UV/H2O2, are methods able to remove diverse classes of organic contaminants and disinfect water and wastewater. However, the variation in the matrix composition can influence the inactivation of microorganisms due to the presence of competing...

Abstract: Advanced oxidation processes, including UV/H2O2, are methods able to remove diverse classes of organic contaminants and disinfect water and wastewater. However, the variation in the matrix composition can influence the inactivation of microorganisms due to the presence of competing reactive material, which consumes the available oxidants. This problem can lead to the use of inadequate oxidant/radiation dose and disturb a correct treatment. The aim of this study was to assess the efficiency of UV/H2O2 to inactivate microbiological indicators in secondary effluents in the presence of high concentration of carbonate, nitrate, metals, and industrial organic contaminants. Metals had a positive influence on inactivation acting as catalysts. Zn, Fe, and all metals simultaneously presented toxic effects to the indicator organisms in the higher concentrations before the treatment. Even in metals presence, the negative effect of carbonate and the industrial organic contaminants on indicators inactivation was very important. Bacteria regrowth after 72h was also affected by the same inhibiting substances, but the metals acted positively inhibiting it. The disinfection indicators had different sensibilities to the spiked substances. Escherichia coli inactivation was more affected than total coliforms by the presence of the industrial contamination, which can lead to different interpretation of inhibition degree depending of the used disinfection indicator

CONSELHO NACIONAL DE DESENVOLVIMENTO CIENTÍFICO E TECNOLÓGICO - CNPQ

424395/2016-9; 308914/2017-1

FUNDAÇÃO DE AMPARO À PESQUISA DO ESTADO DE SÃO PAULO - FAPESP

2014/17774-1, 2016/079117

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