Development of MCM-D technology with photosensitive benzocyclobutene
Cristina B. Adamo, Alexander Flacker, Hercilio M. Cavalcanti, Ricardo C. Teixeira, Antonio L. P. Rotondaro, Leandro T. Manera
ARTIGO
Inglês
Agradecimentos: The authors would like to acknowledge CTI Renato Archer (DEE, DMS and DAPE), CCSUNICAMP, CNPq, FAPESP, FINEP, CNPEM (LNNano), CI-Brasil and INCT Namitec
This paper evaluates and compares the development of Multi-Chip Module Deposited (MCM-D) technology using photosensitive benzocyclobutene (BCB) with the non-photosensitive BCB to fabricate passive devices. The polymer was used to isolate the metal/interconnection layers and also as the dielectric...
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This paper evaluates and compares the development of Multi-Chip Module Deposited (MCM-D) technology using photosensitive benzocyclobutene (BCB) with the non-photosensitive BCB to fabricate passive devices. The polymer was used to isolate the metal/interconnection layers and also as the dielectric for the capacitors. Ni-P/Au was used as the conductor film and Ta2N as the resistor film. The resistors’ sheet resistance was measured with both transfer length method (TLM) and direct measurement while the measurements of the capacitors and inductors required the use of a Vector Network Analyzer (VNA) and some mathematical algorithms
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FUNDAÇÃO DE AMPARO À PESQUISA DO ESTADO DE SÃO PAULO - FAPESP
CONSELHO NACIONAL DE DESENVOLVIMENTO CIENTÍFICO E TECNOLÓGICO - CNPQ
FINANCIADORA DE ESTUDOS E PROJETOS - FINEP
Aberto
Texto completo: https://www.sbmicro.org.br/jics/
Development of MCM-D technology with photosensitive benzocyclobutene
Cristina B. Adamo, Alexander Flacker, Hercilio M. Cavalcanti, Ricardo C. Teixeira, Antonio L. P. Rotondaro, Leandro T. Manera
Development of MCM-D technology with photosensitive benzocyclobutene
Cristina B. Adamo, Alexander Flacker, Hercilio M. Cavalcanti, Ricardo C. Teixeira, Antonio L. P. Rotondaro, Leandro T. Manera
Fontes
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Journal of integrated circuits and systems (Fonte avulsa) |