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Development of MCM-D technology with photosensitive benzocyclobutene

Development of MCM-D technology with photosensitive benzocyclobutene

Cristina B. Adamo, Alexander Flacker, Hercilio M. Cavalcanti, Ricardo C. Teixeira, Antonio L. P. Rotondaro, Leandro T. Manera

ARTIGO

Inglês

Agradecimentos: The authors would like to acknowledge CTI Renato Archer (DEE, DMS and DAPE), CCSUNICAMP, CNPq, FAPESP, FINEP, CNPEM (LNNano), CI-Brasil and INCT Namitec

This paper evaluates and compares the development of Multi-Chip Module Deposited (MCM-D) technology using photosensitive benzocyclobutene (BCB) with the non-photosensitive BCB to fabricate passive devices. The polymer was used to isolate the metal/interconnection layers and also as the dielectric... Ver mais

FUNDAÇÃO DE AMPARO À PESQUISA DO ESTADO DE SÃO PAULO - FAPESP

CONSELHO NACIONAL DE DESENVOLVIMENTO CIENTÍFICO E TECNOLÓGICO - CNPQ

FINANCIADORA DE ESTUDOS E PROJETOS - FINEP

Aberto

Development of MCM-D technology with photosensitive benzocyclobutene

Cristina B. Adamo, Alexander Flacker, Hercilio M. Cavalcanti, Ricardo C. Teixeira, Antonio L. P. Rotondaro, Leandro T. Manera

										

Development of MCM-D technology with photosensitive benzocyclobutene

Cristina B. Adamo, Alexander Flacker, Hercilio M. Cavalcanti, Ricardo C. Teixeira, Antonio L. P. Rotondaro, Leandro T. Manera

    Fontes

    Journal of integrated circuits and systems (Fonte avulsa)