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|Type:||Artigo de periódico|
|Title:||ANODIC NIOBIUM PENTOXIDE FILMS - GROWTH AND THICKNESS DETERMINATION BY INSITU OPTOELECTROCHEMICAL MEASUREMENTS|
|Abstract:||Data on optical reflectance and anodization voltage, obtained during the galvanostatic anodization of metallic niobium foils in an H3PO4(1%) solution at room temperature were simultaneously recorded as a function of time, to determine the thickness of the Nb2O5 films formed. From these data, plots of film thickness vs anodization voltage were obtained. A linear relation was always observed and in all cases but one, an angular coefficient of 22 angstrom V-1 was verified.|
|Editor:||Pergamon-elsevier Science Ltd|
|Citation:||Electrochimica Acta. Pergamon-elsevier Science Ltd, v. 36, n. 8, n. 1297, n. 1300, 1991.|
|Appears in Collections:||Unicamp - Artigos e Outros Documentos|
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