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Type: Artigo de periódico
Title: Adsorption of silanes bearing nitrogenated Lewis bases on SiO2/Si (100) model surfaces
Author: Andresa, JS
Reis, RM
Gonzalez, EP
Santos, LS
Eberlin, MN
Nascente, PAD
Tanimoto, ST
Machado, SAS
Rodrigues-Filho, UP
Abstract: The present paper describes the one-pot procedure for the formation of self-assembled thin films of two silanes on the model oxidized silicon wafer, SiO2/Si. SiO2/Si is a model system for other surfaces, such as glass, quartz, aerosol, and silica gel. MALDI-TOF MS with and without a matrix, XPS, and AFM have confirmed the formation of self-assembled thin films of both 3-imidazolyipropyltrimethoxysilane (3-IPTS) and 4-(N-propyltriethoxysilane-imino)pyridine (4-PTSIP) on the SiO2/Si surface after 30 min. Longer adsorption times lead to the deposition of nonreacted 3-IPTS precursors and the formation of agglomerates on the 3-IPTS monolayer. The formation of 4-PTSIP self-assembled layers on SiO2/Si is also demonstrated. The present results for the flat SiO2/Si surface can lead to a better understanding of the formation of a stationary phase for affinity chromatography as well as tran sition-metal-supported catalysts on silica and their relationship with surface roughness and ordering. The 3-IPTS and 4-PTSIP modified SiO2/Si wafers can also be envisaged as possible built-on-sil icon thin-layer chromatography (TLC) extraction devices for metal determination or N-heterocycle analytes, such as histidine and histamine, with 'on-spot' MALDI-TOF MS detection. © 2005 Elsevier Inc. All rights reserved.
Subject: 3-imidazolylpropyltrimethoxysilane
self-assembled thin films
silicon dioxide
silicon wafer
Country: EUA
Editor: Academic Press Inc Elsevier Science
Citation: Journal Of Colloid And Interface Science. Academic Press Inc Elsevier Science, v. 286, n. 1, n. 303, n. 309, 2005.
Rights: fechado
Identifier DOI: 10.1016/j.jcis.2005.01.019
Date Issue: 2005
Appears in Collections:Unicamp - Artigos e Outros Documentos

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