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dc.contributor.CRUESPUniversidade Estadual de Campinaspt_BR
dc.typeArtigo de periódicopt_BR
dc.titleSecondary Electron Contrast Modulation in SU-8 Photoresist Films Exposed Holographicallypt_BR
dc.contributor.authorAvila, LFpt_BR
dc.contributor.authorGutierrez-Rivera, Lpt_BR
dc.contributor.authorCescato, Lpt_BR
unicamp.author.emaillfavila@ifi.unicamp.brpt_BR
unicamp.authorAvila, L. F. Gutierrez-Rivera, Luis Cescato, Lucila Univ Estadual Campinas, Univ Campinas, Inst Phys Gleb Wataghin, Opt Lab, BR-13083970 Campinas, SP, Brazilpt_BR
dc.subjectatomic force microscopy (AFM)pt_BR
dc.subjectcationic polymerizationpt_BR
dc.subjectholographypt_BR
dc.subjectphotoresistspt_BR
dc.subjectscanning electron microscopypt_BR
dc.subject.wosChemically Amplified Resistspt_BR
dc.subject.wosUv-curable Epoxypt_BR
dc.subject.wosOptical Lithographypt_BR
dc.subject.wosMemspt_BR
dc.subject.wosFabricationpt_BR
dc.subject.wosDiffusionpt_BR
dc.subject.wosAcidpt_BR
dc.subject.wosTopographypt_BR
dc.subject.wosUltrathickpt_BR
dc.subject.wosKineticspt_BR
dc.description.abstractWe report a Secondary Electron (SE) contrast modulation observed in scanning electron microscope photographs of the cross-section of SU-8 photoresist films exposed holographically. The modulation occurs along the whole depth of the sample and its contrast disappears when the samples are submitted to the post exposure bake (PEB). Diffraction and atomic force microscopy measurements of the samples were performed before and after PEB to investigate this modulation. The results indicate that this SE emission contrast modulation comes from the spatial chemical modulation generated by the photolysis during the exposure of the SU-8 films. (C) 2009 Wiley Periodicals, Inc. J Polym Sci Part B: Polym Phys 48: 226-230, 2010pt
dc.relation.ispartofJournal Of Polymer Science Part B-polymer Physicspt_BR
dc.relation.ispartofabbreviationJ. Polym. Sci. Pt. B-Polym. Phys.pt_BR
dc.publisher.cityHobokenpt_BR
dc.publisher.countryEUApt_BR
dc.publisherJohn Wiley & Sons Incpt_BR
dc.date.issued2010pt_BR
dc.date.monthofcirculation42005pt_BR
dc.identifier.citationJournal Of Polymer Science Part B-polymer Physics. John Wiley & Sons Inc, v. 48, n. 2, n. 226, n. 230, 2010.pt_BR
dc.language.isoenpt_BR
dc.description.volume48pt_BR
dc.description.issuenumber2pt_BR
dc.description.firstpage226pt_BR
dc.description.lastpage230pt_BR
dc.rightsfechadopt_BR
dc.rights.licensehttp://olabout.wiley.com/WileyCDA/Section/id-406071.htmlpt_BR
dc.sourceWeb of Sciencept_BR
dc.identifier.issn0887-6266pt_BR
dc.identifier.wosidWOS:000273581500016pt_BR
dc.identifier.doi10.1002/polb.21865pt_BR
dc.description.sponsorshipFundação de Amparo à Pesquisa do Estado de São Paulo (FAPESP)pt_BR
dc.description.sponsorshipConselho Nacional de Desenvolvimento Científico e Tecnológico (CNPq)pt_BR
dc.description.sponsorship1Fundação de Amparo à Pesquisa do Estado de São Paulo (FAPESP)pt_BR
dc.description.sponsorship1Conselho Nacional de Desenvolvimento Científico e Tecnológico (CNPq)pt_BR
dc.date.available2014-11-17T16:45:52Z
dc.date.available2015-11-26T16:44:49Z-
dc.date.accessioned2014-11-17T16:45:52Z
dc.date.accessioned2015-11-26T16:44:49Z-
dc.description.provenanceMade available in DSpace on 2014-11-17T16:45:52Z (GMT). No. of bitstreams: 1 WOS000273581500016.pdf: 181242 bytes, checksum: c7a38ab6e48958120dcfcd4c81fd55a3 (MD5) Previous issue date: 2010en
dc.description.provenanceMade available in DSpace on 2015-11-26T16:44:49Z (GMT). No. of bitstreams: 2 WOS000273581500016.pdf: 181242 bytes, checksum: c7a38ab6e48958120dcfcd4c81fd55a3 (MD5) WOS000273581500016.pdf.txt: 21588 bytes, checksum: 3540bb696a4b32fcafae5be663dfba70 (MD5) Previous issue date: 2010en
dc.identifier.urihttp://www.repositorio.unicamp.br/jspui/handle/REPOSIP/71276pt_BR
dc.identifier.urihttp://www.repositorio.unicamp.br/handle/REPOSIP/71276
dc.identifier.urihttp://repositorio.unicamp.br/jspui/handle/REPOSIP/71276-
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