Please use this identifier to cite or link to this item:
Type: Artigo de periódico
Title: Method of porous diamond deposition on porous silicon
Author: Baranauskas, V
Peterlevitz, AC
Chang, DC
Durrant, SF
Abstract: In this paper, we discuss the experimental results of the fabrication of porous diamond/porous silicon and porous diamond structures by chemical vapor deposition of diamond over a skeleton of porous silicon, replicating the porous surface geometry around the Si pores and also creating new porous diamond structures. Scanning electron microscopy (SEM) revealed that the diamond nuclei are deposited on the top of the porous silicon skeleton, forming isolated grains in the first nucleation stages, and then growing like the usual structure of most ceramic materials, making a self-sustained porous diamond structure. Raman spectroscopy revealed that the diamond films are of good quality, close to that of diamond films grown on crystalline silicon. (C) 2001 Elsevier Science B.V. All rights reserved.
Subject: porous diamond deposition
porous silicon
chemical vapor deposition
porous materials
diamond membranes
Country: Holanda
Editor: Elsevier Science Bv
Citation: Applied Surface Science. Elsevier Science Bv, v. 185, n. 41671, n. 108, n. 113, 2001.
Rights: fechado
Identifier DOI: 10.1016/S0169-4332(01)00648-1
Date Issue: 2001
Appears in Collections:Unicamp - Artigos e Outros Documentos

Files in This Item:
File Description SizeFormat 
WOS000173117500015.pdf277.78 kBAdobe PDFView/Open

Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.