Please use this identifier to cite or link to this item:
Type: Artigo de periódico
Title: AZ-1518 Photoresist analysis with synchrotron radiation using high-resolution time-of-flight mass spectrometry
Author: Mendes, LAV
Pinho, RR
Avila, LF
Lima, CRA
Rocco, MLM
Abstract: With the aim of identifying molecular modifications among photoresists unexposed and previously exposed to the ultraviolet light the photon stimulated ion desorption (PSID) technique was employed in the study of the AZ-1518 photoresist. Data acquisition was performed at the Brazilian Synchrotron Light Source (LNLS), during a single-bunch operation mode of the storage ring and using high-resolution time-of-flight mass spectrometry (TOF-MS) for ion analysis. PSID mass spectra on both photoresists (unexposed and exposed) were obtained following the SK-shell photoexcitation and desorption ion yield curves have been determined for the main fragments as a function of the photon energy. The AZ-1518 photoresists presented different PSID spectra, showing characteristic fragments. Most of the analyzed ions showed larger relative yields for the exposed photoresist. Fragments related to the photochemical decomposition of the photoresist could be clearly identified. These results showed that the PSID technique is adequate to investigate structural changes in molecular level in unexposed and exposed photoresists. (c) 2007 Elsevier Ltd. All rights reserved.
Subject: photoresist
photon stimulated ion desorption
positive ions
time-of-flight mass spectrometry
Country: Inglaterra
Editor: Elsevier Sci Ltd
Citation: Polymer Degradation And Stability. Elsevier Sci Ltd, v. 92, n. 6, n. 933, n. 938, 2007.
Rights: fechado
Identifier DOI: 10.1016/j.polymdegradstab.2007.03.011
Date Issue: 2007
Appears in Collections:Unicamp - Artigos e Outros Documentos

Files in This Item:
File Description SizeFormat 
WOS000247545200001.pdf687.19 kBAdobe PDFView/Open

Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.